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Scientific results
Realisation of photonic crystals operating in the UV range, by laser interference lithography and plasma etching.
One of the challenges of this project is to develop processes enabling the realisation of very low lattice parameter photonic crystals (230nm), over wide areas (several centimetres square).
Combining laser interference lithography and reactive ion etching at Laboratoire Hubert Curien and INL, 2D photonic crystals could be realised with a very high homogeneity. Their specific optical properties make it possible to increase dramatically light absorption around wavelengths of 380nm.
2D photonic crystal (realised by Laser Interference Lithography and Reactive Ion Etching). Left: grating printed in the photoresist layer (period = 230 nm). Right: scanning electron microscope view of the structure after plasma etching.
2D photonic crystal (realised by Laser Interference Lithography and Reactive Ion Etching). Left: grating printed in the photoresist layer (period = 230 nm). Right: scanning electron microscope view of the structure after plasma etching.
